CMOS Nanoelectronics: Innovative Devices, Architectures, and Applications

✍ Scribed by Nadine Collaert (Editor)

• Publisher: Jenny Stanford Publishing
• Year: 2012
• Leaves: 444
• Edition: 1
• Category: Library

✦ Synopsis

This book covers one of the most important device architectures that have been widely researched to extend the transistor scaling: FinFET. Starting with theory, the book discusses the advantages and the integration challenges of this device architecture. It addresses in detail the topics such as high-density fin patterning, gate stack design, and s

✦ Table of Contents

General Introduction. Part 1: Integration of Multigate Devices (FinFET). Introduction to Multigate Devices and Integration Challenges. Patterning Requirements for Multigate Devices. Gate Stack Design. Source/Drain Design: Reduction of Parasitic Resistance. Part 2: Circuit-Related Aspects. Variability and Its Implications for FinFET SRAM. High T Performance of FinFET. ESD and Multigate Devices. Part 3: Beyond FinFET.The Junctionless Nanowire Transistor. Transport in Nanostructures. Transport Spectroscopy of a Single Dopant in a Gated Silicon Nanowire. Thermionic Theory as a Tool for the Study of Transport in Doped and Undoped Si n-FINFETs Scaled Up to the Full Body Inversion Limit.

✦ Subjects

Bioscience;Biotechnology;Engineering & Technology;Materials Science