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ChemInform Abstract: Polyhedral Oligomeric Silsesquioxane (POSS)-Based Polymers.

✍ Scribed by J. J. SCHWAB; J. D. LICHTENHAN

Publisher
John Wiley and Sons
Year
2010
Weight
25 KB
Volume
30
Category
Article
ISSN
0931-7597

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## Abstract Polyhedral oligomeric silsesquioxane (POSS) polymers were synthesized by the dehydrogenative condensation of (HSiO~3/2~)~8~ with water in the presence of diethylhydroxylamine followed by trimethylsilylation. Coating films were prepared by spin‐coating of the coating solution prepared by