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ChemInform Abstract: Influence of Substrate Temperature on Physical Structure of AlN Thin Films Prepared on Polycrystalline MoSi2 by rf Magnetron Sputtering.

✍ Scribed by M. AKIYAMA; H. R. KOKABI; K. NONAKA; K. SHOBU; T. WATANABE

Book ID: 112030075
Publisher: John Wiley and Sons
Year: 2010
Weight: 29 KB
Volume: 27
Category: Article
ISSN: 0931-7597
DOI: 10.1002/chin.199615002

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