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ChemInform Abstract: A New Tungsten Gate Metal Oxide Semiconductor Capacitor Using a Chemical Vapor Deposition Process.

✍ Scribed by W.-K. YEH; Y.-C. SHIAU; M.-C. CHEN

Publisher: John Wiley and Sons
Year: 2010
Weight: 28 KB
Volume: 28
Category: Article
ISSN: 0931-7597
DOI: 10.1002/chin.199720232

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