𝔖 Bobbio Scriptorium
✦   LIBER   ✦

ChemInform Abstract: A 0.25 μm MOSFET Technology Using In Situ Rapid Thermal Gate Dielectrics.

✍ Scribed by K. X. ZHANG; C. M. OSBURN; G. HAMES; C. PARKER; A. BAYOUMI


Book ID
112033841
Publisher
John Wiley and Sons
Year
2010
Weight
31 KB
Volume
27
Category
Article
ISSN
0931-7597

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES