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Chemically vapour-deposited hard coatings: Applications and selection guidelines

✍ Scribed by B. Lux; R. Haubner; C. Wohlrab

Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
1010 KB
Volume
38
Category
Article
ISSN
0257-8972

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In this work the use of two metallo-organic compounds, titanium tetrakisdialkylamides, was investigated with a pulsed d.c. plasma-assisted chemical vapour deposition process to deposit layers on steel substrates and hard metals. The layers have been studied by scanning electron microscopy X-ray diff