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Chemical vapour deposition of tungsten by H2 reduction of WC16

โœ Scribed by J.A.M. Ammerlaan; D.R.M. Boogaard; P.J. van der Put; J. Schoonman


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
634 KB
Volume
53
Category
Article
ISSN
0169-4332

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We have deposited tungsten on silicon from WF 6 and H 2 by laser-assisted chemical vapour deposition. An ArF excimer laser was aligned parallel to the substrate. The deposition experiments were performed to investigate reactions between WF 6 and the silicon substrate. We investigated the roughness a