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Chemical vapour deposition of titanium oxides in the composition range TiO1.60–TiO1.75

✍ Scribed by Eva Fredriksson; Jan-Otto Carlsson


Publisher
Elsevier Science
Year
1985
Tongue
English
Weight
438 KB
Volume
124
Category
Article
ISSN
0040-6090

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Chemical vapour deposition of the oxides
✍ Ryan C. Smith; Tiezhong Ma; Noel Hoilien; Lancy Y. Tsung; Malcolm J. Bevan; Luig 📂 Article 📅 2000 🏛 John Wiley and Sons 🌐 English ⚖ 340 KB 👁 3 views

A brief survey of the precursors used for the chemical vapour deposition of the dioxides of titanium, zirconium and hafnium is presented. The review covers precursors used for the closely related process known as atomic layer chemical vapour deposition (ALCVD or ALD). Precursors delivered by standar