✦ LIBER ✦

Chemical vapour deposition of oxide and metal films for VLSI applications

✍ Scribed by K Hieber; H Körner; H Treichel

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Chemical vapour deposition and character

✍ G.A. Battiston; R. Gerbasi; M. Porchia; R. Bertoncello; F. Caccavale 📂 Article 📅 1996 🏛 Elsevier Science 🌐 English ⚖ 506 KB

Study of graded aluminium oxide films pr

✍ C. Dhanavantri; R.N. Karekar; V.J. Rao 📂 Article 📅 1985 🏛 Elsevier Science 🌐 English ⚖ 301 KB

Deposition of tantalum oxide films by Ar

✍ Yukio Nishimura; Kyoji Tokunaga; Masaharu Tsuji 📂 Article 📅 1993 🏛 Elsevier Science 🌐 English ⚖ 478 KB

Properties of aluminium oxide films prep

✍ Chang Jin Kang; John S. Chun; Wong Jong Lee 📂 Article 📅 1990 🏛 Elsevier Science 🌐 English ⚖ 741 KB

Chemical vapour deposition of tungsten f

✍ Y. Pauleau 📂 Article 📅 1984 🏛 Elsevier Science 🌐 English ⚖ 915 KB

Structural studies of chemically vapour-

✍ N.Srinivasa Murty; S.R. Jawalekar 📂 Article 📅 1983 🏛 Elsevier Science 🌐 English ⚖ 273 KB