Chemical vapor deposition: Principles and applications. Edited by M. L. Hitchman and K. F. Jensen, Academic Press, London 1993, 677 pp., hardback, $ 75, ISBN 0-12-349 670-5

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• Publisher: John Wiley and Sons
• Year: 1994
• Tongue: English
• Weight: 273 KB
• Volume: 6
• Category: Article
• ISSN: 0935-9648
• DOI: 10.1002/adma.19940060125