Chemical Vapor Deposition. Precursors, Processes and Applications. Herausgegeben von Anthony C. Jones und Michael L. Hitchman.

✍ Scribed by Graziella Malandrino

• Publisher: John Wiley and Sons
• Year: 2009
• Tongue: English
• Weight: 182 KB
• Volume: 121
• Category: Article
• ISSN: 0044-8249
• DOI: 10.1002/ange.200903570