Chemical Vapor Deposition of Ru Thin Films with an Enhanced Morphology, Thermal Stability, and Electrical Properties Using a RuO 4 Precursor

✍ Scribed by Han, Jeong Hwan; Lee, Sang Woon; Choi, Gyu-Jin; Lee, Sang Young; Hwang, Cheol Seong; Dussarrat, Christian; Gatineau, Julien

• Book ID: 127078989
• Publisher: American Chemical Society
• Year: 2009
• Tongue: English
• Weight: 727 KB
• Volume: 21
• Category: Article
• ISSN: 0897-4756
• DOI: 10.1021/cm802485r