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Chemical Vapor Deposition of Mercury on Alkanedithiolate Self-Assembled Monolayers

โœ Scribed by Aliganga, Anne Kathrena A.; Wang, Zhehui; Mittler, Silvia

Book ID
127337917
Publisher
American Chemical Society
Year
2004
Tongue
English
Weight
488 KB
Volume
108
Category
Article
ISSN
0022-3654

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Recent studies show that the self-assembled monolayer (SAM) is well suited to control the selectivity of chemical vapor deposition (CVD). Here, we reported the selective CVD for copper on the functionalized SAM surfaces (with -SH, -SS-, and -SO 3 H terminal groups). The -SS-and -SO 3 H terminal grou