Chemical Vapor Deposition of Copper from (hfac)CuL (L = VTMS and 2-Butyne) in the Presence of Water, Methanol, and Dimethyl Ether

✍ Scribed by Jain, A.; Kodas, T. T.; Corbitt, T. S.; Hampden-Smith, M. J.

• Book ID: 126815502
• Publisher: American Chemical Society
• Year: 1996
• Tongue: English
• Weight: 303 KB
• Volume: 8
• Category: Article
• ISSN: 0897-4756
• DOI: 10.1021/cm950546y