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Chemical states study of Si in SiOx films grown by PECVD

โœ Scribed by S.S. Chao; Y. Takagi; G. Lucovsky; P. Pai; R.C. Custer; J.E. Tyler; J.E. Keem


Publisher
Elsevier Science
Year
1986
Tongue
English
Weight
429 KB
Volume
26
Category
Article
ISSN
0169-4332

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