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Chemical Etching of Silicon

โœ Scribed by Schwartz, B.; Robbins, H.


Book ID
121867666
Publisher
The Electrochemical Society
Year
1961
Tongue
English
Weight
805 KB
Volume
108
Category
Article
ISSN
0013-4651

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๐Ÿ“œ SIMILAR VOLUMES


Chemical Etching of Silicon
โœ Schwartz, B. ๐Ÿ“‚ Article ๐Ÿ“… 1976 ๐Ÿ› The Electrochemical Society ๐ŸŒ English โš– 1000 KB
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โœ Robbins, Harry; Schwartz, Bertram ๐Ÿ“‚ Article ๐Ÿ“… 1959 ๐Ÿ› The Electrochemical Society ๐ŸŒ English โš– 410 KB
Chemical Etching of Silicon
โœ Robbins, Harry; Schwartz, Bertram ๐Ÿ“‚ Article ๐Ÿ“… 1959 ๐Ÿ› The Electrochemical Society ๐ŸŒ English โš– 410 KB

The kinetics of the etching of silicon in the system HF, HNO~, and H~O was studied as a function of the composition of the etchant at 25~ A triaxial plot of the etch rate vs. composition of the etchant shows two extreme modes of behavior. In the region of high nitric acid compositions, etch rates ar

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