Chemical characterization of superficial layers of monocrystalline silicon after annealing in a RF hydrogen plasma

✍ Scribed by D. Ballutaud; G. Moulin; M. Aucouturier

• Publisher: Elsevier Science
• Year: 1986
• Weight: 57 KB
• Volume: 178
• Category: Article
• ISSN: 0167-2584
• DOI: 10.1016/0167-2584(86)90130-1