Chemical characterization of SiCxNy nanolayers by FTIR-and Raman spectroscopy, XPS and TXRF-NEXAFS

✍ Scribed by O. Baake; N.I. Fainer; P. Hoffmann; M.L. Kosinova; Yu.M. Rumyantsev; V.A. Trunova; A. Klein; W. Ensinger; B. Pollakowski; B. Beckhoff; G. Ulm

• Publisher: Elsevier Science
• Year: 2009
• Tongue: English
• Weight: 357 KB
• Volume: 603
• Category: Article
• ISSN: 0168-9002
• DOI: 10.1016/j.nima.2009.03.007

✦ Synopsis

SiC

x N y nanolayers were synthesized by a remote plasma enhanced chemical vapour deposition (RPECVD) method and chemically characterized by Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), and near-edge X-ray absorption fine structure investigations in total reflection X-ray fluorescence geometry (TXRF-NEXAFS). The results are compared with those obtained for standard samples SiC and Si 3 N 4 (and with spectra from the literature). As a first result, two or more compounds containing Si-N bonds (not Si 3 N 4 ), one compound with a Si-C bond (not SiC), and graphitic carbon were identified.