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Chemical beam epitaxy of high purity InP using tertiarybutylphosphine and 1,2 bis-phosphinoethane

โœ Scribed by M. Zahzouh; G. Hincelin; R. Mellet; A.M. Pougnet


Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
293 KB
Volume
21
Category
Article
ISSN
0921-5107

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