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Charge transfer and electric strength of thin silicon oxynitride films

✍ Scribed by V. I. Kubrin; V. F. Korzo; E. G. Dorofeeva; M. V. Kacharava

Book ID: 112428618
Publisher: Springer
Year: 1983
Tongue: English
Weight: 398 KB
Volume: 26
Category: Article
ISSN: 1573-9228
DOI: 10.1007/bf00896663

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## Abstract Silicon oxynitride (SiO~x~ N~y~) thin films were deposited on silicon substrates by ion‐assisted deposition. Variable angle spectroscopic ellipsometry (VASE) was used to optically characterize the deposited film properties, such as layer thickness and composition, film surface and inter