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Characterization of ZnO and ZnO:Al films deposited by MOCVD on oriented and amorphous substrates

✍ Scribed by Maria Elena Fragala; Graziella Malandrino


Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
755 KB
Volume
40
Category
Article
ISSN
0026-2692

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✍ J.J. Ding; H.X. Chen; S.Y. Ma πŸ“‚ Article πŸ“… 2010 πŸ› Elsevier Science 🌐 English βš– 475 KB

Al-doped ZnO (ZnO:Al) thin films were deposited on Si substrates using the radio-frequency reactive magnetron sputtering technique. Effect of Al contents and annealing treatments on the structural and photoluminescence (PL) properties of ZnO films was investigated. The results showed that crystallin