Characterization of ultra-shallow p+-n junction diodes fabricated by 500-eV boron-ion implantation

✍ Scribed by Hong, S.N.; Ruggles, G.A.; Wortman, J.J.; Myers, E.R.; Hren, J.J.

• Book ID: 114537100
• Publisher: IEEE
• Year: 1991
• Tongue: English
• Weight: 569 KB
• Volume: 38
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/16.65732