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Characterization of ultra-hard silicon carbide coatings deposited by RF magnetron sputtering

✍ Scribed by A.K Costa; S.S Camargo Jr; C.A Achete; R Carius

Book ID
114085276
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
196 KB
Volume
377-378
Category
Article
ISSN
0040-6090

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The paper presents the results obtained on the deposition and characterization of niobium carbide thin films obtained by reactive magnetron sputtering method in a reactive atmosphere composed by Ar and CH 4 . The coatings were deposited on Si substrates, at 100 Β°C, 400 Β°C and 750 Β°C, at two differen