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Characterization of thin films using heavy ion beams

โœ Scribed by H Timmers; R G Elliman; T R Ophel


Book ID
110659873
Publisher
Springer-Verlag
Year
1999
Tongue
English
Weight
807 KB
Volume
22
Category
Article
ISSN
0250-4707

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An ion beam deposition system to produce isotopically pure epitaxial thin films of different materials has been designed and built. Using negative ions, problems due to mass interference with molecular ions could be significantly reduced, thus allowing the production, for instance, of 29 Si films of