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Characterization of the surface of bio-ceramic thin films

✍ Scribed by A.M. Ektessabi; H. Kimura

Book ID
107864712
Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
604 KB
Volume
270
Category
Article
ISSN
0040-6090

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The silicon-rich oxide (SiO x ) films were deposited using the LPCVD (Low Pressure Chemical Vapour Deposition) method at the temperature of 570 Β°C and with silane and oxygen as the reactant gasses. The films were deposited on silicon (1 1 1) substrates. The flows of oxygen and silan in the horizonta