Characterization of the silicon nitride–thermal oxide interface in oxide–nitride–oxide structures by ELS, XPS, ellipsometry, and numerical simulation

✍ Scribed by V.A. Gritsenko; S.N. Svitasheva; I.P. Petrenko; Yu.N. Novikov; Yu.N. Morokov; Hei Wong; R.W.M. Kwok; R.W.M. Chan

• Book ID: 108362354
• Publisher: Elsevier Science
• Year: 1998
• Tongue: English
• Weight: 330 KB
• Volume: 38
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/s0026-2714(98)00019-5