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Characterization of the morphology and composition of commercial negative resists used for lithographic processes

✍ Scribed by B.-E. Schuster; A. Haug; M. Häffner; M. M. Blideran; M. Fleischer; H. Peisert; D. P. Kern; T. Chassé

Publisher
Springer
Year
2008
Tongue
English
Weight
412 KB
Volume
393
Category
Article
ISSN
1618-2650

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