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Lithographic evaluation of a new wet silylation process using safe solvents and the commercial photoresist AZ 5214ETM

✍ Scribed by E. Gogolides; K.H. Baik; K. Yannakopoulou; L. Van den hove; M. Hatzakis


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
335 KB
Volume
23
Category
Article
ISSN
0167-9317

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