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Characterization of the interfacial reaction between sputter-deposited Ni film and Si substrate

โœ Scribed by R. Zhou; C.C. Chen; M. Hashimoto; J. Shi; Y. Nakamura

Publisher
Springer
Year
2005
Tongue
English
Weight
831 KB
Volume
80
Category
Article
ISSN
1432-0630

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XPS characterization of surface and interfacial structure of sputtered TiNi films on Si substrate
โœ Yongqing Fu; Hejun Du; Sam Zhang; Weimin Huang ๐Ÿ“‚ Article ๐Ÿ“… 2005 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 621 KB

TiNi films were prepared by co-sputtering TiNi and Ti targets. X-ray photoelectron spectroscopy (XPS) was employed to study surface chemistry of the films and interfacial structure of Si/TiNi system. Exposure of the TiNi film to the ambient atmosphere (23 โ€ข C and 80% relatively humidity) facilitated