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Characterization of structure and distortion in the manganese ions implanted TiO2 thin films

โœ Scribed by Peng Ding; Fa-Min Liu; Xin-An Yang; Jian-Qi Li


Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
888 KB
Volume
267
Category
Article
ISSN
0168-583X

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Structural characterization of DC magnet
โœ B. Karunagaran; R.T. Rajendra Kumar; V. Senthil Kumar; D. Mangalaraj; Sa.K. Nara ๐Ÿ“‚ Article ๐Ÿ“… 2003 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 293 KB

Titanium dioxide films have been deposited using DC magnetron sputtering technique onto well-cleaned p-silicon substrates at an oxygen partial pressure of 7 ร‚ 10 -5 mbar and at a sputtering pressure (Ar+O 2 ) of 1 ร‚ 10 -3 mbar. The deposited films were calcinated at 673 and 773 K. The composition of