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Characterization of silicon nitride films formed in an RF glow discharge

✍ Scribed by Kenji Murakami; Takayuki Takeuchi; Kenji Ishikawa; Tatsuo Yamamoto


Publisher
Elsevier Science
Year
1988
Tongue
English
Weight
309 KB
Volume
33-34
Category
Article
ISSN
0169-4332

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