Characterization of Si/Ge interfaces by diffuse X-ray scattering in the region of total external reflection

✍ Scribed by J.-P. Schlomka; M.R. Fitzsimmons; R. Pynn; J. Stettner; O.H. Seeck; M. Tolan; W. Press

• Publisher: Elsevier Science
• Year: 1996
• Tongue: English
• Weight: 673 KB
• Volume: 221
• Category: Article
• ISSN: 0921-4526
• DOI: 10.1016/0921-4526(95)00903-5