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Characterization of semiconductor oxides by IR diffuse reflectance spectroscopy

โœ Scribed by Kaori Matsuo; Katsuyuki Nakano


Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
255 KB
Volume
41-42
Category
Article
ISSN
0169-4332

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A new method is described for evaluating the stability of emulsion bases and active components contained within such emulsions. Diffuse reflectance spectroscopy (DRS) is a technique that has the capability of detecting changes in particle size, surface properties, or drug quality of emulsions as a f