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Characterization of pit morphology of sputtered Al-1wt.%Si-0.5wt.%Cu alloy thin film

✍ Scribed by Seung-Jin Orr; Su-Il Pyun; Soo-Woo Nam


Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
449 KB
Volume
279
Category
Article
ISSN
0040-6090

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Repassivation behaviour of Al-1 wt.%Si-0.5 wt.%Cu alloy has been investigated as a function of applied potential in 0.5 M Na,SO, solutions containing various chloride ion concentrations ranging from 0 to OSM in terms of potentiostatic current transients by using an abrading electrode technique. The