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Characterization of NiO thin film grown by two-step processes

✍ Scribed by Xin Wang; Ye Li; GuoZheng Wang; Rong Xiang; DeLong Jiang; ShenCheng Fu; Kui Wu; XiaoYu Yang; QingDuo DuanMu; JingQuan Tian; LiChen Fu


Book ID
103887004
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
252 KB
Volume
404
Category
Article
ISSN
0921-4526

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Characterization of NiO thin films depos
✍ I HotovΓ½; D BΓΊc; Ε  Haőčík; O Nennewitz πŸ“‚ Article πŸ“… 1998 πŸ› Elsevier Science 🌐 English βš– 398 KB

Nickel oxide (NiO) thin films were deposited by dc reactive magnetron sputtering Ni in an Ar+O, mixed atmosphere at room temperature on unheated Si substrates. The oxygen content in the gas was varied from 10 to 50% and its effect on the deposition rate, structural, composition and electrical proper