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Characterization of hydrogen–plasma interactions with photoresist, silicon, and silicon nitride surfaces

✍ Scribed by Thedjoisworo, Bayu A.; Cheung, David; Zamani, Davoud

Book ID
121293405
Publisher
AVS (American Vacuum Society)
Year
2012
Tongue
English
Weight
858 KB
Volume
30
Category
Article
ISSN
0734-2101

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Silicon and silicon nitride surfaces have been successfully terminated with carboxylic acid monolayers and investigated by atomic force microscopy (AFM) and scanning near-field optical microscopy (SNOM). On clean Si surface, AFM showed topographical variations of 0.3-0.4 nm while for the clean Si 3