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Characterization of Hafnium-Zirconium-Oxide-Nitride films grown by ion beam assisted deposition

✍ Scribed by C.G. Jin; T. Yu; Y. Bo; Y. Zhao; H.Y. Zhang; Y.J. Dong; X.M. Wu; L.J. Zhuge; S.B. Ge

No coin nor oath required. For personal study only.

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