Characterization of GaS-deposited CVD diamond films by AES and XPS
โ Scribed by A.B.M.O Islam; Y Nishiyama; T Tambo; C Tatsuyama; T Ito
- Book ID
- 104309117
- Publisher
- Elsevier Science
- Year
- 2000
- Tongue
- English
- Weight
- 180 KB
- Volume
- 159-160
- Category
- Article
- ISSN
- 0169-4332
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โฆ Synopsis
ลฝ
. ลฝ . Thin GaS films deposited on B-doped diamond as-grown and on oxygen-annealed B-doped diamond O-ann. films ลฝ .
q ลฝ . grown by plasma-assisted chemical vapor deposition CVD on p -type Si 001 substrate were characterized by Auger ลฝ . ลฝ . electron spectroscopy AES , and X-ray photoemission spectroscopy XPS . The thermal evaporation of GaS single crystal is used for the deposition. Ga and S Auger peaks are observed in the AES spectra of both GaS-deposited samples, and only weak S-Auger peaks are observed in the samples post-annealed at about 9008C. XPS spectra indicate an upward band bending due to GaS deposition and the increase in the downward band bending due to post-annealing at higher temperature. ``ลฝ . C S and C Ga bonds are observed for GaS-deposited diamond films. Secondary electron emission SEE spectra indicate ลฝ . that the S-terminated diamond films seem to possess positive electron affinity PEA surface.
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