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Characterization of GaS-deposited CVD diamond films by AES and XPS

โœ Scribed by A.B.M.O Islam; Y Nishiyama; T Tambo; C Tatsuyama; T Ito


Book ID
104309117
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
180 KB
Volume
159-160
Category
Article
ISSN
0169-4332

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โœฆ Synopsis


ลฝ

. ลฝ . Thin GaS films deposited on B-doped diamond as-grown and on oxygen-annealed B-doped diamond O-ann. films ลฝ .

q ลฝ . grown by plasma-assisted chemical vapor deposition CVD on p -type Si 001 substrate were characterized by Auger ลฝ . ลฝ . electron spectroscopy AES , and X-ray photoemission spectroscopy XPS . The thermal evaporation of GaS single crystal is used for the deposition. Ga and S Auger peaks are observed in the AES spectra of both GaS-deposited samples, and only weak S-Auger peaks are observed in the samples post-annealed at about 9008C. XPS spectra indicate an upward band bending due to GaS deposition and the increase in the downward band bending due to post-annealing at higher temperature. ``ลฝ . C S and C Ga bonds are observed for GaS-deposited diamond films. Secondary electron emission SEE spectra indicate ลฝ . that the S-terminated diamond films seem to possess positive electron affinity PEA surface.


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