𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Characterization of chromium nitride and carbonitride coatings deposited at low temperature by organometallic chemical vapour deposition

✍ Scribed by F. Schuster; F. Maury; J.F. Nowak; C. Bernard


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
951 KB
Volume
46
Category
Article
ISSN
0257-8972

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Analysis of the transition layer in sili
✍ Tanaka, Koki; Tsuge, Atsuko; Takiyama, Makoto; Shimizu, Ryuichi πŸ“‚ Article πŸ“… 1999 πŸ› John Wiley and Sons 🌐 English βš– 246 KB πŸ‘ 2 views

A silicon nitride Ðlm was deposited on an Si(100) substrate with a silicon dioxide surface layer from and NH 3 by low-pressure chemical vapour deposition under various conditions. The etching rates of the silicon SiH 2 Cl 2 nitride Ðlms by bu †ered hydroΓ‘uoric acid (BHF) were investigated using Ruth