Characterization of a-SiC:H films produced in a standard plasma enhanced chemical vapor deposition system for x-ray mask application

✍ Scribed by A. Jean; M. Chaker; Y. Diawara; P. K. Leung; E. Gat; P. P. Mercier; H. Pépin; S. Gujrathi; G. G. Ross; J. C. Kieffer

• Book ID: 121845822
• Publisher: American Institute of Physics
• Year: 1992
• Tongue: English
• Weight: 879 KB
• Volume: 72
• Category: Article
• ISSN: 0021-8979
• DOI: 10.1063/1.351471