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Characterization of a Magnetron Plasma for Deposition of Titanium Oxide and Titanium Nitride Films

✍ Scribed by R. Hippler; S. Wrehde; V. Straňák; O. Zhigalov; H. Steffen; M. Tichý; M. Quaas; H. Wulff

Publisher: John Wiley and Sons
Year: 2005
Tongue: English
Weight: 301 KB
Volume: 45
Category: Article
ISSN: 0005-8025
DOI: 10.1002/ctpp.200510040

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