Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl

✍ Scribed by Lee, Keunwoo; Kim, Keunjun; Park, Taeyong; Jeon, Hyeongtag; Lee, Youngjin; Kim, Jeongtae; Yeom, Seungjin

• Book ID: 119957147
• Publisher: The Electrochemical Society
• Year: 2007
• Tongue: English
• Weight: 541 KB
• Volume: 154
• Category: Article
• ISSN: 0013-4651
• DOI: 10.1149/1.2769327