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Characteristics of ta2O5 thin film prepared by electron beam heating method

✍ Scribed by Yoshihiro Sekido

Book ID
112078907
Publisher
John Wiley and Sons
Year
1994
Tongue
English
Weight
519 KB
Volume
77
Category
Article
ISSN
8756-663X

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## Abstract Tantalum‐doped indium tin oxide thin films were deposited by a cosputtering technique with an ITO target and a Ta~2~O~5~ target. The variations of microstructure, electrical and optical properties with substrate temperature and annealing temperature were investigated in some detail. Ta‐