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Characteristics of rare‐earth element erbium implanted in silicon

✍ Scribed by Tang, Y. S.; Heasman, K. C.; Gillin, W. P.; Sealy, B. J.


Book ID
118236105
Publisher
American Institute of Physics
Year
1989
Tongue
English
Weight
511 KB
Volume
55
Category
Article
ISSN
0003-6951

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Donor formation in silicon owing to ion
✍ F.P. Widdershoven; J.P.M. Naus 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 317 KB

Schottky diodes in n-and pope silicon, implanted with erbium and subsequently annealed at 900 °C were characterized with capacitance-voltage (CV) and deep level transient spectroscopy (DL TS) techniques. The implanted samples showed an excess donor concentration with a depth profile similar to an er