Donor formation in silicon owing to ion
✍
F.P. Widdershoven; J.P.M. Naus
📂
Article
📅
1989
🏛
Elsevier Science
🌐
English
⚖ 317 KB
Schottky diodes in n-and pope silicon, implanted with erbium and subsequently annealed at 900 °C were characterized with capacitance-voltage (CV) and deep level transient spectroscopy (DL TS) techniques. The implanted samples showed an excess donor concentration with a depth profile similar to an er