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Characteristics of ion beam deposited copper thin films as a seed layer: effect of negative substrate bias voltage

โœ Scribed by J.-W. Lim; K. Miyake; M. Isshiki


Book ID
108388687
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
648 KB
Volume
434
Category
Article
ISSN
0040-6090

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