Characteristics of high-k gate oxide prepared by oxidation of multi-layered Hf/Zr/Hf/Zr/Hf metal films

✍ Scribed by M.T. Yu; S.-W. Jeong; H.J. Lee; Y. Roh

• Book ID: 108289674
• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 889 KB
• Volume: 516
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/j.tsf.2007.03.076