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Characteristics of a-C:H:Si films deposited by r.f. sputtering under various deposition conditions

✍ Scribed by Martino, C. De; Demichelis, F.; Tagliaferro, A.


Book ID
123456332
Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
313 KB
Volume
3
Category
Article
ISSN
0925-9635

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## Abstract In this study, the deposition temperature effects on the properties of hydrogenated amorphous silicon films are reported. The a‐Si:H thin films were deposited by DC magnetron sputtering technique, according to a new protocol of deposition. This last consists of a successively several th