Characteristics improvement of HfO2/Ge gate stack structure by fluorine treatment of germanium surface

✍ Scribed by Hyun Lee; Dong Hun Lee; Takeshi Kanashima; Masanori Okuyama

• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 959 KB
• Volume: 254
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/j.apsusc.2008.04.110