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Characterisation of undoped gallium antimonide grown by metalorganic chemical vapour deposition

✍ Scribed by A Subekti; E.M Goldys; T.L Tansley


Book ID
104152146
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
226 KB
Volume
61
Category
Article
ISSN
0022-3697

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✦ Synopsis


Metalorganic chemical vapour deposition grown GaSb films on GaAs have been optimised for combined morphology, electrical and optical properties by variations in substrate temperature and V/III ratio. The transport properties of the films grown at 540ЊC depend on precursor ratios with a V/III ratio of 0.72 providing hole mobilities of around 500 cm 2 V Οͺ1 s Οͺ1 and hole concentration about 3 Γ— 10 16 cm Οͺ3 : For higher temperatures, the mobility decreases and the carrier concentration increases. Changing the V/III ratio for 540ЊC growth results in slight mobility loss in Sb-rich conditions and severe degradation in excess Ga conditions. Comparison of experimental and theoretical temperature dependencies of mobility shows good agreement, while differences between measured hole and inferred total impurity concentrations suggest the contribution of deeper compensating impurities. Films grown at lower temperatures were found to have very good optical quality and bandgaps equal to the bulk value of of 0.72 eV. Above 500ЊC, the band tailing starts to develop, when substantial disorder becomes apparent at 560ЊC and above. This disorder is also observed in the Raman spectra of films grown at these temperatures. For the V/III ratio the highest optical quality was obtained for films grown with V=III 2:0: The excitonic features in absorption are observed for the first time in GaSb.


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## Abstract The growth of high‐performance Mg‐doped p‐type Al~__x__~ Ga~1–__x__~ N (__x__ = 0.35) layers using low‐pressure metalorganic chemical vapour deposition on an AlN/sapphire template is reported. The influence of growth conditions on the p‐type conductivity of the Al~__x__~ Ga~1–__x__~ N (