Characterisation of sub-100 nm-MOS-transistors processed by optical lithography and a sidewall-etchback technique

✍ Scribed by J.T. Horstmann; U. Hilleringmann; K. Goser

• Publisher: Elsevier Science
• Year: 1996
• Tongue: English
• Weight: 996 KB
• Volume: 30
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(95)00280-4